Fabrication of silicon pyramid/nanowire binary structure with superhydrophobicity

Xiaocheng Li; Beng Kang Tay; Philippe Miele; Arnaud Brioude; David Cornu

doi:10.1016/j.apsusc.2009.03.047

Fabrication of silicon pyramid/nanowire binary structure with superhydrophobicity

Xiaocheng Li, Beng Kang Tay^*, Philippe Miele, Arnaud Brioude, David Cornu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

49 Citations (Scopus)

Abstract

A pyramid/nanowire binary structure is fabricated on the silicon surface via a NaOH anisotropic etching technique followed by a silver-catalyzed chemical etching process. The silicon surface shows a stable superhydrophobicity with high contact angle of 162° and small sliding angle less than 2° after being modified with octadecyltrichlorosilane (ODTS). The binary roughness of pyramid/nanowire structure presents a stable composite interface of silicon-air-water and responsible for the superhydrophobicity of silicon surface.

Original language	English
Pages (from-to)	7147-7152
Number of pages	6
Journal	Applied Surface Science
Volume	255
Issue number	16
DOIs	https://doi.org/10.1016/j.apsusc.2009.03.047
Publication status	Published - May 30 2009
Externally published	Yes

ASJC Scopus Subject Areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Keywords

Binary roughness
Contact angle hysteresis
Pyramid/nanowire binary structure
Silicon
Superhydrophobicity

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10.1016/j.apsusc.2009.03.047

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title = "Fabrication of silicon pyramid/nanowire binary structure with superhydrophobicity",

abstract = "A pyramid/nanowire binary structure is fabricated on the silicon surface via a NaOH anisotropic etching technique followed by a silver-catalyzed chemical etching process. The silicon surface shows a stable superhydrophobicity with high contact angle of 162° and small sliding angle less than 2° after being modified with octadecyltrichlorosilane (ODTS). The binary roughness of pyramid/nanowire structure presents a stable composite interface of silicon-air-water and responsible for the superhydrophobicity of silicon surface.",

keywords = "Binary roughness, Contact angle hysteresis, Pyramid/nanowire binary structure, Silicon, Superhydrophobicity",

author = "Xiaocheng Li and Tay, {Beng Kang} and Philippe Miele and Arnaud Brioude and David Cornu",

year = "2009",

month = may,

day = "30",

doi = "10.1016/j.apsusc.2009.03.047",

language = "English",

volume = "255",

pages = "7147--7152",

journal = "Applied Surface Science",

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TY - JOUR

T1 - Fabrication of silicon pyramid/nanowire binary structure with superhydrophobicity

AU - Li, Xiaocheng

AU - Tay, Beng Kang

AU - Miele, Philippe

AU - Brioude, Arnaud

AU - Cornu, David

PY - 2009/5/30

Y1 - 2009/5/30

N2 - A pyramid/nanowire binary structure is fabricated on the silicon surface via a NaOH anisotropic etching technique followed by a silver-catalyzed chemical etching process. The silicon surface shows a stable superhydrophobicity with high contact angle of 162° and small sliding angle less than 2° after being modified with octadecyltrichlorosilane (ODTS). The binary roughness of pyramid/nanowire structure presents a stable composite interface of silicon-air-water and responsible for the superhydrophobicity of silicon surface.

AB - A pyramid/nanowire binary structure is fabricated on the silicon surface via a NaOH anisotropic etching technique followed by a silver-catalyzed chemical etching process. The silicon surface shows a stable superhydrophobicity with high contact angle of 162° and small sliding angle less than 2° after being modified with octadecyltrichlorosilane (ODTS). The binary roughness of pyramid/nanowire structure presents a stable composite interface of silicon-air-water and responsible for the superhydrophobicity of silicon surface.

KW - Binary roughness

KW - Contact angle hysteresis

KW - Pyramid/nanowire binary structure

KW - Silicon

KW - Superhydrophobicity

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DO - 10.1016/j.apsusc.2009.03.047

M3 - Article

AN - SCOPUS:67349268945

SN - 0169-4332

VL - 255

SP - 7147

EP - 7152

JO - Applied Surface Science

JF - Applied Surface Science

IS - 16

ER -

Fabrication of silicon pyramid/nanowire binary structure with superhydrophobicity

Abstract

ASJC Scopus Subject Areas

Keywords

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