Ferroelectric copolymer P(VDF-TrFE) as gate dielectric in organic field effect transistors for memory application devices

A. C. Nguyen*, P. S. Lee

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Fabrication of ferroelectric memory field effect transistor (FEMFET) is presented with copolymer P(VDF-TrFE) as gate dielectric. Spin-coated copolymer film has semicrystalline structure after annealing, in which the crystallites contains ferroelectric and paraelectric phase. Dipolar alignment in ferroelectric phase is controlled with the sweeping of transistor gate bias. Ferroelectric remanent polarization enables current retention in the transistor during OFF state that can be used in non-volatile memory application.

Original languageEnglish
Title of host publicationNanoSingapore 2006
Subtitle of host publicationIEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings
Pages179-182
Number of pages4
DOIs
Publication statusPublished - 2006
Externally publishedYes
Event2006 IEEE Conference on Emerging Technologies - Nanoelectronics - Singapore, Singapore
Duration: Jan 10 2006Jan 13 2006

Publication series

NameNanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectronics - Proceedings
Volume2006

Conference

Conference2006 IEEE Conference on Emerging Technologies - Nanoelectronics
Country/TerritorySingapore
CitySingapore
Period1/10/061/13/06

ASJC Scopus Subject Areas

  • General Engineering

Keywords

  • FEMFET
  • Ferroelectric polymer
  • P(VDF-TRFE)

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