Ferroelectric thin-film devices: Failure mechanisms and new prototype nano-structures

J. F. Scott, F. D. Morrison, Y. K. Hoo, A. D. Milliken, H. J. Fan, S. Kawasaki, M. Miyake, T. Tatsuta, O. Tsuji

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Several fundamental physics problems concerning ferroelectric thin films are discussed with direct application to industry problems. The first is a model of dielectric breakdown under d.c. voltage stressing, extended from single capacitor films to multilayer capacitors (MLCs). The second is an analysis of flash-over (arcing) breakdown in MLCs, including those with base metal electrodes (Ni). The third is the demonstration that any equivalent circuit model for real ferroelectric memories (FRAMs) must include a constant phase element (CPE). We then consider novel new prototype devices with industry potential for commercialization: three-dimensional [3D] DRAM capacitor trenches; piezoelectric nanotubes; and carbon nano-wire arrays with ferroelectric tips.

Original languageEnglish
Title of host publication2007 16th IEEE International Symposium on the Applications of Ferroelectrics, ISAF
Pages5-8
Number of pages4
DOIs
Publication statusPublished - 2007
Externally publishedYes
Event2007 16th IEEE International Symposium on the Applications of Ferroelectrics, ISAF - Nara-city, Japan
Duration: May 27 2007May 31 2007

Publication series

NameIEEE International Symposium on Applications of Ferroelectrics

Conference

Conference2007 16th IEEE International Symposium on the Applications of Ferroelectrics, ISAF
Country/TerritoryJapan
CityNara-city
Period5/27/075/31/07

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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