Field emission properties and surface structure of nickel containing amorphous carbon

G. Y. Chen; J. S. Chen; Z. Sun; Y. J. Li; S. P. Lau; B. K. Tay; J. W. Chai

doi:10.1016/S0169-4332(01)00328-2

Field emission properties and surface structure of nickel containing amorphous carbon

G. Y. Chen^*, J. S. Chen, Z. Sun, Y. J. Li, S. P. Lau, B. K. Tay, J. W. Chai

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

Nickel containing amorphous carbon (a-C:Ni) films have been deposited by filtered cathodic vacuum arc (FCVA) technique by introducing pure nickel into the graphite target. The field electron emission property of a-C:Ni was improved when compared to that of pure tetrahedral amorphous carbon (ta-C) by FCVA. The emission threshold field of a-C:Ni film is about 5 V μm ^-1 , whilst the threshold field of the ta-C film is about 13 V μm ^-1 . Raman spectroscopy suggests that the sp ² clusters in the carbon film increase both in size and number when Ni is introduced. However, the emission was found to degrade to threshold fields beyond 20 V μm ^-1 after the a-C:Ni film was left in ambient for a week. This observation is attributed to surface absorption of oxygen on the a-C:Ni film, as determined by X-ray Photoelectron Spectroscopy.

Original language	English
Pages (from-to)	185-190
Number of pages	6
Journal	Applied Surface Science
Volume	180
Issue number	3-4
DOIs	https://doi.org/10.1016/S0169-4332(01)00328-2
Publication status	Published - Aug 16 2001
Externally published	Yes

ASJC Scopus Subject Areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Keywords

Amorphous carbon (ta-C)
Indium-tin-oxide (ITO)
Tetrahedral amorphous carbon (ta-C)

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10.1016/S0169-4332(01)00328-2

Cite this

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title = "Field emission properties and surface structure of nickel containing amorphous carbon",

abstract = " Nickel containing amorphous carbon (a-C:Ni) films have been deposited by filtered cathodic vacuum arc (FCVA) technique by introducing pure nickel into the graphite target. The field electron emission property of a-C:Ni was improved when compared to that of pure tetrahedral amorphous carbon (ta-C) by FCVA. The emission threshold field of a-C:Ni film is about 5 V μm -1 , whilst the threshold field of the ta-C film is about 13 V μm -1 . Raman spectroscopy suggests that the sp 2 clusters in the carbon film increase both in size and number when Ni is introduced. However, the emission was found to degrade to threshold fields beyond 20 V μm -1 after the a-C:Ni film was left in ambient for a week. This observation is attributed to surface absorption of oxygen on the a-C:Ni film, as determined by X-ray Photoelectron Spectroscopy.",

keywords = "Amorphous carbon (ta-C), Indium-tin-oxide (ITO), Tetrahedral amorphous carbon (ta-C)",

author = "Chen, {G. Y.} and Chen, {J. S.} and Z. Sun and Li, {Y. J.} and Lau, {S. P.} and Tay, {B. K.} and Chai, {J. W.}",

year = "2001",

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doi = "10.1016/S0169-4332(01)00328-2",

language = "English",

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journal = "Applied Surface Science",

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T1 - Field emission properties and surface structure of nickel containing amorphous carbon

AU - Chen, G. Y.

AU - Chen, J. S.

AU - Sun, Z.

AU - Li, Y. J.

AU - Lau, S. P.

AU - Tay, B. K.

AU - Chai, J. W.

PY - 2001/8/16

Y1 - 2001/8/16

N2 - Nickel containing amorphous carbon (a-C:Ni) films have been deposited by filtered cathodic vacuum arc (FCVA) technique by introducing pure nickel into the graphite target. The field electron emission property of a-C:Ni was improved when compared to that of pure tetrahedral amorphous carbon (ta-C) by FCVA. The emission threshold field of a-C:Ni film is about 5 V μm -1 , whilst the threshold field of the ta-C film is about 13 V μm -1 . Raman spectroscopy suggests that the sp 2 clusters in the carbon film increase both in size and number when Ni is introduced. However, the emission was found to degrade to threshold fields beyond 20 V μm -1 after the a-C:Ni film was left in ambient for a week. This observation is attributed to surface absorption of oxygen on the a-C:Ni film, as determined by X-ray Photoelectron Spectroscopy.

AB - Nickel containing amorphous carbon (a-C:Ni) films have been deposited by filtered cathodic vacuum arc (FCVA) technique by introducing pure nickel into the graphite target. The field electron emission property of a-C:Ni was improved when compared to that of pure tetrahedral amorphous carbon (ta-C) by FCVA. The emission threshold field of a-C:Ni film is about 5 V μm -1 , whilst the threshold field of the ta-C film is about 13 V μm -1 . Raman spectroscopy suggests that the sp 2 clusters in the carbon film increase both in size and number when Ni is introduced. However, the emission was found to degrade to threshold fields beyond 20 V μm -1 after the a-C:Ni film was left in ambient for a week. This observation is attributed to surface absorption of oxygen on the a-C:Ni film, as determined by X-ray Photoelectron Spectroscopy.

KW - Amorphous carbon (ta-C)

KW - Indium-tin-oxide (ITO)

KW - Tetrahedral amorphous carbon (ta-C)

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DO - 10.1016/S0169-4332(01)00328-2

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VL - 180

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EP - 190

JO - Applied Surface Science

JF - Applied Surface Science

IS - 3-4

ER -

Field emission properties and surface structure of nickel containing amorphous carbon

Abstract

ASJC Scopus Subject Areas

Keywords

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