First demonstration of gate voltage-less chemical vapour deposition graphene for non-vacuum thermoelectric study

Li Lynn Shiau*, Xingli Wang, Simon Chun Kiat Goh, Kailiang Chuan, Henrik Ernst, Beng Kang Tay

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Graphene has been well studied to be an excellent thermoelectric (TE) material of choice for thermal detection. It is widely considered a key enabler for next-in-class infrared (IR) detectors given its superb carrier mobility, sensitivities and broadband absorption in far-IR range surpassing that of current thermopiles. Normally, TE studies are conducted using graphene exfoliated from graphite crystal. It is then transferred onto Si/SiO2 substrate and fabricated into Hall bar configuration with microheater at one end. A gate voltage (Vg) is passed through the substrate and the response is examined in vacuum condition. By tuning the Vg, one can possibly obtain different thermoelectric power (TEP) values. The challenge is to maintain optimum Vg for the TE device to function which requires higher power consumption. This translate to the need for additional power supply. In this report, we proposed CVDG as TE material. Typically, CVDG are synthesized on Cu film and eventually transferred onto Si/SiO2 substrate. The benefit of CVDG is that it is large area, relatively inexpensive and does not require a Vg with associated circuitry. For the first time, CVDG system was extended to nonvacuum condition to simulate open detector system where detector is exposed to sensing environment. Average TEP was measured to be 168μV/K at 298K. Moreover, CVDG is tested to be stable in air over several months with little or no decrease in performance. A comprehensive characterization between exfoliated and CVDG will be presented. In addition, measurement results for vacuum and non-vacuum detector mode will be compared as well.

Original languageEnglish
Title of host publicationImage Sensing Technologies
Subtitle of host publicationMaterials, Devices, Systems, and Applications V
EditorsAchyut K. Dutta, Nibir K. Dhar
PublisherSPIE
ISBN (Electronic)9781510618237
DOIs
Publication statusPublished - 2018
Externally publishedYes
EventImage Sensing Technologies: Materials, Devices, Systems, and Applications V 2018 - Orlando, United States
Duration: Apr 16 2018Apr 19 2018

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10656
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceImage Sensing Technologies: Materials, Devices, Systems, and Applications V 2018
Country/TerritoryUnited States
CityOrlando
Period4/16/184/19/18

Bibliographical note

Publisher Copyright:
© 2018 SPIE.

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Keywords

  • 2D Material
  • Chemical Vapour Deposition
  • Gate Voltage
  • Graphene
  • Infrared Detector
  • Seebeck Coefficient
  • Thermoelectric Power
  • Thermopile

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