Formation of thick textured carbon film using filtered cathodic vacuum arc technique

In this work, thick textured carbon film (800 nm) was grown on Si substrate using filtered cathode vacuum arc technique. Multi-cycle of deposition was performed to avoid the high film stress issue hence improve the film adhesion. Scanning electron microscope was used for examining the film surface condition. There was no delamination area found on the thick film deposited using multi-cycle deposition. The bonding composition was investigated using X-ray photoelectron spectroscopy, higher sp2 content was detected for the thick film. And the microstructure of the film was studied using visible Raman spectroscopy, the Raman results showed the typical features of textured carbon for the thick film. The electrical resistivity measured also suggested the thick film grown using this method exhibiting excellent electrical performance.