Formation of thick textured carbon film using filtered cathodic vacuum arc technique

Naiyun Xu; Siu Hon Tsang; Edwin Hang Tong Teo; Beng Kang Tay

doi:10.1109/INEC.2013.6465959

Formation of thick textured carbon film using filtered cathodic vacuum arc technique

Naiyun Xu, Siu Hon Tsang, Edwin Hang Tong Teo^*, Beng Kang Tay

^*Corresponding author for this work

Nanyang Technological University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this work, thick textured carbon film (800nm) was grown on Si substrate using filtered cathode vacuum arc technique. Multi-cycle of deposition was performed to avoid the high film stress issue hence improve the film adhesion. Optical microscope was used for delamination check, the bonding composition was investigated using X-Ray photoelectron spectroscopy, and the microstructure of the film was studied using visible Raman spectroscopy. The electrical property was also studied by measuring the resistivity of the film.

Original language	English
Title of host publication	Proceedings of the 2013 IEEE 5th International Nanoelectronics Conference, INEC 2013
Pages	78-80
Number of pages	3
DOIs	https://doi.org/10.1109/INEC.2013.6465959
Publication status	Published - 2013
Externally published	Yes
Event	2013 IEEE 5th International Nanoelectronics Conference, INEC 2013 - Singapore, Singapore Duration: Jan 2 2013 → Jan 4 2013

Publication series

Name	Proceedings - Winter Simulation Conference
ISSN (Print)	0891-7736

Conference

Conference	2013 IEEE 5th International Nanoelectronics Conference, INEC 2013
Country/Territory	Singapore
City	Singapore
Period	1/2/13 → 1/4/13

ASJC Scopus Subject Areas

Software
Modelling and Simulation
Computer Science Applications

Keywords

FCVA
Raman and Electrical
Textured carbon
XPS

Access to Document

10.1109/INEC.2013.6465959

Cite this

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title = "Formation of thick textured carbon film using filtered cathodic vacuum arc technique",

abstract = "In this work, thick textured carbon film (800nm) was grown on Si substrate using filtered cathode vacuum arc technique. Multi-cycle of deposition was performed to avoid the high film stress issue hence improve the film adhesion. Optical microscope was used for delamination check, the bonding composition was investigated using X-Ray photoelectron spectroscopy, and the microstructure of the film was studied using visible Raman spectroscopy. The electrical property was also studied by measuring the resistivity of the film.",

keywords = "FCVA, Raman and Electrical, Textured carbon, XPS",

author = "Naiyun Xu and Tsang, {Siu Hon} and Teo, {Edwin Hang Tong} and Tay, {Beng Kang}",

year = "2013",

doi = "10.1109/INEC.2013.6465959",

language = "English",

isbn = "9781467348416",

series = "Proceedings - Winter Simulation Conference",

pages = "78--80",

booktitle = "Proceedings of the 2013 IEEE 5th International Nanoelectronics Conference, INEC 2013",

note = "2013 IEEE 5th International Nanoelectronics Conference, INEC 2013 ; Conference date: 02-01-2013 Through 04-01-2013",

}

Xu, N, Tsang, SH, Teo, EHT & Tay, BK 2013, Formation of thick textured carbon film using filtered cathodic vacuum arc technique. in Proceedings of the 2013 IEEE 5th International Nanoelectronics Conference, INEC 2013., 6465959, Proceedings - Winter Simulation Conference, pp. 78-80, 2013 IEEE 5th International Nanoelectronics Conference, INEC 2013, Singapore, Singapore, 1/2/13. https://doi.org/10.1109/INEC.2013.6465959

Formation of thick textured carbon film using filtered cathodic vacuum arc technique. / Xu, Naiyun; Tsang, Siu Hon; Teo, Edwin Hang Tong et al.
Proceedings of the 2013 IEEE 5th International Nanoelectronics Conference, INEC 2013. 2013. p. 78-80 6465959 (Proceedings - Winter Simulation Conference).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Formation of thick textured carbon film using filtered cathodic vacuum arc technique

AU - Xu, Naiyun

AU - Tsang, Siu Hon

AU - Teo, Edwin Hang Tong

AU - Tay, Beng Kang

PY - 2013

Y1 - 2013

N2 - In this work, thick textured carbon film (800nm) was grown on Si substrate using filtered cathode vacuum arc technique. Multi-cycle of deposition was performed to avoid the high film stress issue hence improve the film adhesion. Optical microscope was used for delamination check, the bonding composition was investigated using X-Ray photoelectron spectroscopy, and the microstructure of the film was studied using visible Raman spectroscopy. The electrical property was also studied by measuring the resistivity of the film.

AB - In this work, thick textured carbon film (800nm) was grown on Si substrate using filtered cathode vacuum arc technique. Multi-cycle of deposition was performed to avoid the high film stress issue hence improve the film adhesion. Optical microscope was used for delamination check, the bonding composition was investigated using X-Ray photoelectron spectroscopy, and the microstructure of the film was studied using visible Raman spectroscopy. The electrical property was also studied by measuring the resistivity of the film.

KW - FCVA

KW - Raman and Electrical

KW - Textured carbon

KW - XPS

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T3 - Proceedings - Winter Simulation Conference

SP - 78

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BT - Proceedings of the 2013 IEEE 5th International Nanoelectronics Conference, INEC 2013

T2 - 2013 IEEE 5th International Nanoelectronics Conference, INEC 2013

Y2 - 2 January 2013 through 4 January 2013

ER -

Formation of thick textured carbon film using filtered cathodic vacuum arc technique

Abstract

Publication series

Conference

ASJC Scopus Subject Areas

Keywords

Access to Document

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