Growth and field emission property of coiled carbon nanostructure using copper as catalyst

Zhejuan Zhang; Pingang He; Zhuo Sun; Tao Feng; Yiwei Chen; Huili Li; Beng Kang Tay

doi:10.1016/j.apsusc.2009.12.059

Growth and field emission property of coiled carbon nanostructure using copper as catalyst

Zhejuan Zhang^*, Pingang He, Zhuo Sun, Tao Feng, Yiwei Chen, Huili Li, Beng Kang Tay

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

Coiled carbon nanostructure (CNS) is prepared by a catalytic chemical vapor deposition (CVD) process on copper/chromium films deposited by radio frequency (RF) sputtering. Uniform CNS with coiled structure is fabricated by changing the size of the catalyst particles. The effects of Cu catalyst size and RF sputtering power, on the growth of the coiled CNS are discussed, and the results importantly conclude that Cu-catalyzed CVD offers a preferable control of coiled CNS to optimize the field emission property for application.

Original language	English
Pages (from-to)	4417-4422
Number of pages	6
Journal	Applied Surface Science
Volume	256
Issue number	14
DOIs	https://doi.org/10.1016/j.apsusc.2009.12.059
Publication status	Published - May 1 2010
Externally published	Yes

ASJC Scopus Subject Areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Keywords

Coiled carbon nanostructure
Copper catalyst
Field emission property

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10.1016/j.apsusc.2009.12.059

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title = "Growth and field emission property of coiled carbon nanostructure using copper as catalyst",

abstract = "Coiled carbon nanostructure (CNS) is prepared by a catalytic chemical vapor deposition (CVD) process on copper/chromium films deposited by radio frequency (RF) sputtering. Uniform CNS with coiled structure is fabricated by changing the size of the catalyst particles. The effects of Cu catalyst size and RF sputtering power, on the growth of the coiled CNS are discussed, and the results importantly conclude that Cu-catalyzed CVD offers a preferable control of coiled CNS to optimize the field emission property for application.",

keywords = "Coiled carbon nanostructure, Copper catalyst, Field emission property",

author = "Zhejuan Zhang and Pingang He and Zhuo Sun and Tao Feng and Yiwei Chen and Huili Li and Tay, {Beng Kang}",

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T1 - Growth and field emission property of coiled carbon nanostructure using copper as catalyst

AU - Zhang, Zhejuan

AU - He, Pingang

AU - Sun, Zhuo

AU - Feng, Tao

AU - Chen, Yiwei

AU - Li, Huili

AU - Tay, Beng Kang

PY - 2010/5/1

Y1 - 2010/5/1

N2 - Coiled carbon nanostructure (CNS) is prepared by a catalytic chemical vapor deposition (CVD) process on copper/chromium films deposited by radio frequency (RF) sputtering. Uniform CNS with coiled structure is fabricated by changing the size of the catalyst particles. The effects of Cu catalyst size and RF sputtering power, on the growth of the coiled CNS are discussed, and the results importantly conclude that Cu-catalyzed CVD offers a preferable control of coiled CNS to optimize the field emission property for application.

AB - Coiled carbon nanostructure (CNS) is prepared by a catalytic chemical vapor deposition (CVD) process on copper/chromium films deposited by radio frequency (RF) sputtering. Uniform CNS with coiled structure is fabricated by changing the size of the catalyst particles. The effects of Cu catalyst size and RF sputtering power, on the growth of the coiled CNS are discussed, and the results importantly conclude that Cu-catalyzed CVD offers a preferable control of coiled CNS to optimize the field emission property for application.

KW - Coiled carbon nanostructure

KW - Copper catalyst

KW - Field emission property

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DO - 10.1016/j.apsusc.2009.12.059

M3 - Article

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SN - 0169-4332

VL - 256

SP - 4417

EP - 4422

JO - Applied Surface Science

JF - Applied Surface Science

IS - 14

ER -

Growth and field emission property of coiled carbon nanostructure using copper as catalyst

Abstract

ASJC Scopus Subject Areas

Keywords

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