Abstract
Tetrahedral amorphous carbon (ta-C) is a potential low-cost substitute for diamond in certain applications, but little is known of the temperature range over which its desirable properties are retained. The thermal stability of tetrahedral amorphous carbon (ta-C) films has been investigated by heat treatment of the films at temperatures from room temperature to 450°C in high vacuum, low vacuum and oxygen ambient. It was found that heat treatment in oxygen ambient leads to a much more prominent variation in film thickness, stress and hardness than in both low and high vacuum. Raman studies also show an increase of the G-band frequency to higher values, an increase of the integrated intensity ratio and a narrowing of the G bands for films annealed in oxygen ambient with increasing temperature. By contrast, ta-C films exhibit a high resistance to degradation during treatment in low and high vacuum. They sustain their structure, thickness, stress and hardness for temperatures up to 400°C.
Original language | English |
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Pages (from-to) | 1328-1332 |
Number of pages | 5 |
Journal | Diamond and Related Materials |
Volume | 8 |
Issue number | 7 |
DOIs | |
Publication status | Published - Jul 1999 |
Externally published | Yes |
ASJC Scopus Subject Areas
- Electronic, Optical and Magnetic Materials
- General Chemistry
- Mechanical Engineering
- Materials Chemistry
- Electrical and Electronic Engineering
Keywords
- Amorphous carbon
- Cathodic arc
- Heat treatment
- Raman spectroscopy