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Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties
H. N. Chua*, K. L. Pey, S. Y. Siah, L. Y. Ong, E. H. Lim, C. L. Gan, K. H. See, C. S. Ho
*Corresponding author for this work
Research output: Contribution to conference › Paper › peer-review
9
Citations
(Scopus)