Fingerprint
Dive into the research topics of 'Improved NiSi salicide process using presilicide N2+ implant for MOSFETs'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Improved NiSi salicide process using presilicide N2+ implant for MOSFETs
P. S. Lee*, K. L. Pey, D. Mangelinck, J. Ding, A. T.S. Wee, L. Chan
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
31
Citations
(Scopus)