Improved pentacene device characteristics with sol-gel SiO2 dielectric films

T. Cahyadi, H. S. Tan, E. B. Namdas, S. G. Mhaisalkar*, P. S. Lee, Z. K. Chen, C. M. Ng, F. Y.C. Boey

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

The interfacial interactions between semiconductors and gate dielectrics have a profound influence on the device characteristics of field effect transistors (FETs). This paper reports on the concept of introducing a sol-gel SiO2 as inorganic capping layer to significantly improve device characteristics of pentacene-based FETs. The smoother film surfaces of sol-gel SiO2 (1.9 Å root-mean-square) induced larger pentacene grain sizes, and led to hole mobilities of 1.43 cm2/Vs, on-off ratio of 107, and a subthreshold swing of 102 mV/decade when operating at -20 V.

Original languageEnglish
Pages (from-to)455-459
Number of pages5
JournalOrganic Electronics
Volume8
Issue number4
DOIs
Publication statusPublished - Aug 2007
Externally publishedYes

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • General Chemistry
  • Condensed Matter Physics
  • Materials Chemistry
  • Electrical and Electronic Engineering

Keywords

  • Dielectrics
  • Field effect transistors
  • Pentacene
  • Sol-gel

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