In situ growth of SnO2 nanorods by plasma treatment of SnO 2 thin films

Hui Huang; O. K. Tan; Y. C. Lee; M. S. Tse; J. Guo; T. White

doi:10.1088/0957-4484/17/15/008

In situ growth of SnO₂ nanorods by plasma treatment of SnO ₂ thin films

Hui Huang^*, O. K. Tan, Y. C. Lee, M. S. Tse, J. Guo, T. White

^*Corresponding author for this work

Nanyang Technological University

Research output: Contribution to journal › Article › peer-review

40 Citations (Scopus)

Abstract

SnO₂ thin films were deposited by RF inductively coupled plasma enhanced chemical vapour deposition and then the as-deposited SnO₂ thin films were immersed in the plasma for plasma post-treatment. Uniform SnO₂ nanorods were grown in situ from the SnO₂ thin films during plasma treatment and formed a hybrid structure of SnO₂ nanorod thin films consisting of one-dimensional SnO₂ nanorods embedded in the two-dimensional SnO₂ thin film matrix. The growth of SnO ₂ nanorods follows a sputtering redeposition mechanism. Due to the intrinsically small grain size and high surface-to-volume ratios associated with the nanorods, the SnO₂ nanorod thin films showed much higher sensitivity at lower operating temperatures together with faster response and shorter recovery time compared with the as-deposited SnO₂ thin films.

Original language	English
Article number	008
Pages (from-to)	3668-3672
Number of pages	5
Journal	Nanotechnology
Volume	17
Issue number	15
DOIs	https://doi.org/10.1088/0957-4484/17/15/008
Publication status	Published - Aug 14 2006
Externally published	Yes

ASJC Scopus Subject Areas

Bioengineering
General Chemistry
General Materials Science
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

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10.1088/0957-4484/17/15/008

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abstract = "SnO2 thin films were deposited by RF inductively coupled plasma enhanced chemical vapour deposition and then the as-deposited SnO2 thin films were immersed in the plasma for plasma post-treatment. Uniform SnO2 nanorods were grown in situ from the SnO2 thin films during plasma treatment and formed a hybrid structure of SnO2 nanorod thin films consisting of one-dimensional SnO2 nanorods embedded in the two-dimensional SnO2 thin film matrix. The growth of SnO 2 nanorods follows a sputtering redeposition mechanism. Due to the intrinsically small grain size and high surface-to-volume ratios associated with the nanorods, the SnO2 nanorod thin films showed much higher sensitivity at lower operating temperatures together with faster response and shorter recovery time compared with the as-deposited SnO2 thin films.",

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AU - Huang, Hui

AU - Tan, O. K.

AU - Lee, Y. C.

AU - Tse, M. S.

AU - Guo, J.

AU - White, T.

PY - 2006/8/14

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N2 - SnO2 thin films were deposited by RF inductively coupled plasma enhanced chemical vapour deposition and then the as-deposited SnO2 thin films were immersed in the plasma for plasma post-treatment. Uniform SnO2 nanorods were grown in situ from the SnO2 thin films during plasma treatment and formed a hybrid structure of SnO2 nanorod thin films consisting of one-dimensional SnO2 nanorods embedded in the two-dimensional SnO2 thin film matrix. The growth of SnO 2 nanorods follows a sputtering redeposition mechanism. Due to the intrinsically small grain size and high surface-to-volume ratios associated with the nanorods, the SnO2 nanorod thin films showed much higher sensitivity at lower operating temperatures together with faster response and shorter recovery time compared with the as-deposited SnO2 thin films.

AB - SnO2 thin films were deposited by RF inductively coupled plasma enhanced chemical vapour deposition and then the as-deposited SnO2 thin films were immersed in the plasma for plasma post-treatment. Uniform SnO2 nanorods were grown in situ from the SnO2 thin films during plasma treatment and formed a hybrid structure of SnO2 nanorod thin films consisting of one-dimensional SnO2 nanorods embedded in the two-dimensional SnO2 thin film matrix. The growth of SnO 2 nanorods follows a sputtering redeposition mechanism. Due to the intrinsically small grain size and high surface-to-volume ratios associated with the nanorods, the SnO2 nanorod thin films showed much higher sensitivity at lower operating temperatures together with faster response and shorter recovery time compared with the as-deposited SnO2 thin films.

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In situ growth of SnO₂ nanorods by plasma treatment of SnO ₂ thin films

Abstract

ASJC Scopus Subject Areas

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