Influence of substrate bias on the mechanical properties of ta-C:Co films prepared by filtered cathodic vacuum arc technique

J. X. Guo*, B. K. Tay, X. W. Sun, X. Z. Ding, D. H.C. Chua

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

Cobalt-containing tetrahedral amorphous carbon (ta-C:Co) films were deposited by an off-plane double-bend filtered cathodic vacuum arc (FCVA) technique on silicon wafers at room temperature. The mechanical properties of the ta-C:Co films were systematically studied. Such metal composite coatings exhibit reduced stress, thus enabling the deposition of relatively thick coatings whilst retaining acceptable hardness.

Original languageEnglish
Pages (from-to)393-396
Number of pages4
JournalSurface and Coatings Technology
Volume169-170
DOIs
Publication statusPublished - Jun 2 2003
Externally publishedYes

ASJC Scopus Subject Areas

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Keywords

  • Diamond-like carbon
  • Filtered cathodic vacuum arc
  • Tetrahedral amorphous carbon

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