Integration of CNT in TSV (≤5 μm) for 3D IC application and its process challenges

K. Ghosh, C. C. Yap, B. K. Tay, C. S. Tan

Research output: Chapter in Book/Report/Conference proceedingConference contribution

11 Citations (Scopus)

Abstract

The availability of high density TSVs depends on how smart we miniaturize the interconnect dimension in 3D IC package. A number of considerations include controllable TSV aspect ratio, pitch, and material selection. The International Technology Roadmap for Semiconductors (ITRS) has proposed scaling of TSV diameter down to as low as 2 μm in the future. However, with TSV scaling, the resistance of the TSV increases significantly. Carbon nanotubes (CNTs) could be a potential alternative material to Cu for VLSI interconnects applications, including TSV, due to their outstanding electrical, mechanical, and thermal properties. Here, we demonstrate a method to integrate carbon nanotubes (CNTs)-filled TSV under 5 μm diameter that are connected by metal-lines at the bottom and show the facile route of fabrication at low temperature regime. The process challenges are highlighted.

Original languageEnglish
Title of host publication2013 IEEE International 3D Systems Integration Conference, 3DIC 2013
DOIs
Publication statusPublished - 2013
Externally publishedYes
Event2013 IEEE International 3D Systems Integration Conference, 3DIC 2013 - San Francisco, CA, United States
Duration: Oct 2 2013Oct 4 2013

Publication series

Name2013 IEEE International 3D Systems Integration Conference, 3DIC 2013

Conference

Conference2013 IEEE International 3D Systems Integration Conference, 3DIC 2013
Country/TerritoryUnited States
CitySan Francisco, CA
Period10/2/1310/4/13

ASJC Scopus Subject Areas

  • Computer Graphics and Computer-Aided Design
  • Computer Science Applications

Keywords

  • 3D-IC
  • Carbon nanotube
  • Through-silicon via
  • Wafer bonding

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