Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed si1-x Gex /Si substrates

Y. Setiawan*, P. S. Lee, S. Balakumar, K. L. Pey, X. C. Wang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Laser-induced melt-mediated Ni-based germanosilicide has been formed on condensed SiGe substrates (with 40% Ge). Pure Ni germanosilicide formation was plagued by the presence of amorphous oxygen-rich globules. Platinum alloying has greatly improved the morphology of the laser-induced Ni(Pt) germanosilicide with the alleviation of oxygen incorporation during laser annealing. This results in an improvement in the surface roughness and electrical conductivity of the germanosilicide film. Low affinity of Pt toward oxygen is believed to have resulted in this improvement.

Original languageEnglish
Pages (from-to)H262-H265
JournalElectrochemical and Solid-State Letters
Volume11
Issue number9
DOIs
Publication statusPublished - 2008
Externally publishedYes

ASJC Scopus Subject Areas

  • General Chemical Engineering
  • General Materials Science
  • Physical and Theoretical Chemistry
  • Electrochemistry
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed si1-x Gex /Si substrates'. Together they form a unique fingerprint.

Cite this