Laser-interference lithography tailored for highly symmetrically arranged ZnO nanowire arrays

Dong Sik Kim*, Ran Ji, Hong Jin Fan, Frank Bertram, Roland Scholz, Armin Dadgar, Kornelius Nielsch, Alois Krost, Jürgen Christen, Ulrich Gösele, Margit Zacharias

*Corresponding author for this work

Research output: Contribution to journal › Review article › peer-review

95 Citations (Scopus)

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