Length effects on the reliability of dual-damascene Cu interconnects

F. Wei*, C. L. Gan, C. V. Thompson, J. J. Clement, S. P. Hau-Riege, K. L. Pey, W. K. Choi, H. L. Tay, B. Yu, M. K. Radhakrishnan

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

12 Citations (Scopus)
Original languageEnglish
Pages (from-to)645-650
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume716
DOIs
Publication statusPublished - 2002
Externally publishedYes
EventSilicon Materials - Processing, Characterization and Reliability - San Francisco, CA, United States
Duration: Apr 1 2002Apr 5 2002

ASJC Scopus Subject Areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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