Microstructure and electrical properties of in-situ annealed carbon films

Maziar Shakerzadeh; Beng Kang Tay; Hang Tong Edwin Teo; Chong Wei Tan

doi:10.1109/INEC.2010.5424651

Microstructure and electrical properties of in-situ annealed carbon films

Maziar Shakerzadeh^*, Beng Kang Tay, Hang Tong Edwin Teo, Chong Wei Tan

^*Corresponding author for this work

Nanyang Technological University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Citations (Scopus)

Abstract

The microstructure and electrical properties of in-situ annealed carbon films is studied in this paper. The structure of the films is studied by transmission electron microscopy, electron energy loss spectroscopy and Raman spectroscopy. The microstructure of the films strongly depends on the deposition temperature for the films deposited at high temperatures (higher than 400° C). However, at low temperatures, the substrate bias is the other crucial factor which governs the microstructure of the film. Electrical conductivity of the film strongly depends on the formation of preferred orientation in the microstructure of the films.

Original language	English
Title of host publication	INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
Pages	230-231
Number of pages	2
DOIs	https://doi.org/10.1109/INEC.2010.5424651
Publication status	Published - 2010
Externally published	Yes
Event	2010 3rd International Nanoelectronics Conference, INEC 2010 - Hongkong, China Duration: Jan 3 2010 → Jan 8 2010

Publication series

Name	INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

Conference

Conference	2010 3rd International Nanoelectronics Conference, INEC 2010
Country/Territory	China
City	Hongkong
Period	1/3/10 → 1/8/10

ASJC Scopus Subject Areas

Electrical and Electronic Engineering

Access to Document

10.1109/INEC.2010.5424651

Cite this

@inproceedings{aea2310169bc46f4a20db41de4ffe2c1,

title = "Microstructure and electrical properties of in-situ annealed carbon films",

abstract = "The microstructure and electrical properties of in-situ annealed carbon films is studied in this paper. The structure of the films is studied by transmission electron microscopy, electron energy loss spectroscopy and Raman spectroscopy. The microstructure of the films strongly depends on the deposition temperature for the films deposited at high temperatures (higher than 400° C). However, at low temperatures, the substrate bias is the other crucial factor which governs the microstructure of the film. Electrical conductivity of the film strongly depends on the formation of preferred orientation in the microstructure of the films.",

author = "Maziar Shakerzadeh and Tay, {Beng Kang} and Teo, {Hang Tong Edwin} and Tan, {Chong Wei}",

year = "2010",

doi = "10.1109/INEC.2010.5424651",

language = "English",

isbn = "9781424435449",

series = "INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings",

pages = "230--231",

booktitle = "INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings",

note = "2010 3rd International Nanoelectronics Conference, INEC 2010 ; Conference date: 03-01-2010 Through 08-01-2010",

}

Shakerzadeh, M, Tay, BK, Teo, HTE & Tan, CW 2010, Microstructure and electrical properties of in-situ annealed carbon films. in INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings., 5424651, INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings, pp. 230-231, 2010 3rd International Nanoelectronics Conference, INEC 2010, Hongkong, China, 1/3/10. https://doi.org/10.1109/INEC.2010.5424651

Microstructure and electrical properties of in-situ annealed carbon films. / Shakerzadeh, Maziar; Tay, Beng Kang; Teo, Hang Tong Edwin et al.
INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings. 2010. p. 230-231 5424651 (INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Microstructure and electrical properties of in-situ annealed carbon films

AU - Shakerzadeh, Maziar

AU - Tay, Beng Kang

AU - Teo, Hang Tong Edwin

AU - Tan, Chong Wei

PY - 2010

Y1 - 2010

N2 - The microstructure and electrical properties of in-situ annealed carbon films is studied in this paper. The structure of the films is studied by transmission electron microscopy, electron energy loss spectroscopy and Raman spectroscopy. The microstructure of the films strongly depends on the deposition temperature for the films deposited at high temperatures (higher than 400° C). However, at low temperatures, the substrate bias is the other crucial factor which governs the microstructure of the film. Electrical conductivity of the film strongly depends on the formation of preferred orientation in the microstructure of the films.

AB - The microstructure and electrical properties of in-situ annealed carbon films is studied in this paper. The structure of the films is studied by transmission electron microscopy, electron energy loss spectroscopy and Raman spectroscopy. The microstructure of the films strongly depends on the deposition temperature for the films deposited at high temperatures (higher than 400° C). However, at low temperatures, the substrate bias is the other crucial factor which governs the microstructure of the film. Electrical conductivity of the film strongly depends on the formation of preferred orientation in the microstructure of the films.

UR - http://www.scopus.com/inward/record.url?scp=77951662451&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77951662451&partnerID=8YFLogxK

U2 - 10.1109/INEC.2010.5424651

DO - 10.1109/INEC.2010.5424651

M3 - Conference contribution

AN - SCOPUS:77951662451

SN - 9781424435449

T3 - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

SP - 230

EP - 231

BT - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

T2 - 2010 3rd International Nanoelectronics Conference, INEC 2010

Y2 - 3 January 2010 through 8 January 2010

ER -

Microstructure and electrical properties of in-situ annealed carbon films

Abstract

Publication series

Conference

ASJC Scopus Subject Areas

Access to Document

Other files and links

Fingerprint

Cite this