Miniature plasma focus as a novel device for synthesis of soft magnetic FeCo thin films

Z. Y. Pan; R. S. Rawat; R. Verma; J. J. Lin; H. Yan; R. V. Ramanujan; P. Lee; S. V. Springham; T. L. Tan

doi:10.1016/j.physleta.2009.12.037

Miniature plasma focus as a novel device for synthesis of soft magnetic FeCo thin films

Z. Y. Pan, R. S. Rawat^*, R. Verma, J. J. Lin, H. Yan, R. V. Ramanujan, P. Lee, S. V. Springham, T. L. Tan

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

The Letter reports the first ever application of low energy miniature plasma focus device as a deposition facility for nanostructured thin films. We demonstrate successful utilization of a 120 J fast miniature plasma focus device as a novel facility for the deposition of magnetically soft FeCo thin films. Different gas types and the substrate materials were used to investigate their effects on magnetic properties of the films. The FeCo films deposited on Si₍₁₀₀₎ with hydrogen as the filling gas were found to have an average grain size of 10.8 ± 1.2 nm with narrow size distribution and soft magnetic properties with coercivity of about 6.3 Oe. The experimental coercivity value matched reasonably well with the theoretical calculation done using ripple theory.

Original language	English
Pages (from-to)	1043-1048
Number of pages	6
Journal	Physics Letters, Section A: General, Atomic and Solid State Physics
Volume	374
Issue number	8
DOIs	https://doi.org/10.1016/j.physleta.2009.12.037
Publication status	Published - Feb 8 2010
Externally published	Yes

ASJC Scopus Subject Areas

General Physics and Astronomy

Keywords

FeCo
Miniature plasma focus device
Soft magnetic thin films

Access to Document

10.1016/j.physleta.2009.12.037

Cite this

@article{dc5ac4b5c5cf4a6db91623eaa199e1ab,

title = "Miniature plasma focus as a novel device for synthesis of soft magnetic FeCo thin films",

abstract = "The Letter reports the first ever application of low energy miniature plasma focus device as a deposition facility for nanostructured thin films. We demonstrate successful utilization of a 120 J fast miniature plasma focus device as a novel facility for the deposition of magnetically soft FeCo thin films. Different gas types and the substrate materials were used to investigate their effects on magnetic properties of the films. The FeCo films deposited on Si(100) with hydrogen as the filling gas were found to have an average grain size of 10.8 ± 1.2 nm with narrow size distribution and soft magnetic properties with coercivity of about 6.3 Oe. The experimental coercivity value matched reasonably well with the theoretical calculation done using ripple theory.",

keywords = "FeCo, Miniature plasma focus device, Soft magnetic thin films",

author = "Pan, {Z. Y.} and Rawat, {R. S.} and R. Verma and Lin, {J. J.} and H. Yan and Ramanujan, {R. V.} and P. Lee and Springham, {S. V.} and Tan, {T. L.}",

year = "2010",

month = feb,

day = "8",

doi = "10.1016/j.physleta.2009.12.037",

language = "English",

volume = "374",

pages = "1043--1048",

journal = "Physics Letters, Section A: General, Atomic and Solid State Physics",

issn = "0375-9601",

publisher = "Elsevier",

number = "8",

}

TY - JOUR

T1 - Miniature plasma focus as a novel device for synthesis of soft magnetic FeCo thin films

AU - Pan, Z. Y.

AU - Rawat, R. S.

AU - Verma, R.

AU - Lin, J. J.

AU - Yan, H.

AU - Ramanujan, R. V.

AU - Lee, P.

AU - Springham, S. V.

AU - Tan, T. L.

PY - 2010/2/8

Y1 - 2010/2/8

N2 - The Letter reports the first ever application of low energy miniature plasma focus device as a deposition facility for nanostructured thin films. We demonstrate successful utilization of a 120 J fast miniature plasma focus device as a novel facility for the deposition of magnetically soft FeCo thin films. Different gas types and the substrate materials were used to investigate their effects on magnetic properties of the films. The FeCo films deposited on Si(100) with hydrogen as the filling gas were found to have an average grain size of 10.8 ± 1.2 nm with narrow size distribution and soft magnetic properties with coercivity of about 6.3 Oe. The experimental coercivity value matched reasonably well with the theoretical calculation done using ripple theory.

AB - The Letter reports the first ever application of low energy miniature plasma focus device as a deposition facility for nanostructured thin films. We demonstrate successful utilization of a 120 J fast miniature plasma focus device as a novel facility for the deposition of magnetically soft FeCo thin films. Different gas types and the substrate materials were used to investigate their effects on magnetic properties of the films. The FeCo films deposited on Si(100) with hydrogen as the filling gas were found to have an average grain size of 10.8 ± 1.2 nm with narrow size distribution and soft magnetic properties with coercivity of about 6.3 Oe. The experimental coercivity value matched reasonably well with the theoretical calculation done using ripple theory.

KW - FeCo

KW - Miniature plasma focus device

KW - Soft magnetic thin films

UR - http://www.scopus.com/inward/record.url?scp=74149094736&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=74149094736&partnerID=8YFLogxK

U2 - 10.1016/j.physleta.2009.12.037

DO - 10.1016/j.physleta.2009.12.037

M3 - Article

AN - SCOPUS:74149094736

SN - 0375-9601

VL - 374

SP - 1043

EP - 1048

JO - Physics Letters, Section A: General, Atomic and Solid State Physics

JF - Physics Letters, Section A: General, Atomic and Solid State Physics

IS - 8

ER -

Miniature plasma focus as a novel device for synthesis of soft magnetic FeCo thin films

Abstract

ASJC Scopus Subject Areas

Keywords

Access to Document

Other files and links

Fingerprint

Cite this