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On the deposition mechanism of a-C:H films by plasma enhanced chemical vapor deposition
Y. H. Cheng*, Y. P. Wu, J. G. Chen, X. L. Qiao, C. S. Xie, B. K. Tay, S. P. Lau, X. Shi
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
38
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(Scopus)