On the upper limit of sp3 content in tetrahedral amorphous carbon film

X. Shi*, L. K. Cheah, J. R. Shi, Z. Sun, B. K. Tay

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)

Abstract

The morphological properties of the tetrahedral amorphous carbon (ta-C) films deposited by the filtered cathodic vacuum arc (FCVA) technique have been studied over the carbon ion energy range 15 to 200 eV. All the films studied are very smooth with a roughness below 0.6 nm. The minimum roughness (∼0.12 nm) occurs at the highest sp3 content. The lateral feature size increases with ion energy. There appear to be two different growth mechanisms before and after the peak sp3 content. The morphological result suggests an upper limit sp3 content of about 89% in the ta-C films deposited by FCVA technique.

Original languageEnglish
Pages (from-to)185-189
Number of pages5
JournalJournal of Physics Condensed Matter
Volume11
Issue number1
DOIs
Publication statusPublished - 1999
Externally publishedYes

ASJC Scopus Subject Areas

  • General Materials Science
  • Condensed Matter Physics

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