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Oxygen-Based Microwave Induced Plasma Etching for Epoxy Molding Compound Removal in Advanced Semiconductor Devices
Hong Siang Tan*, Bernice Zee, Chee Lip Gan, Katherine Kor, Jiaqi Tang, Mark McKinnon
*Corresponding author for this work
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
1
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(Scopus)