Performance Optimization of Atomic Layer Deposited HfOxMemristor by Annealing With Back-End-of-Line Compatibility

Hong Chen, Lianzheng Li, Jinbin Wang, Guangchao Zhao, Yida Li, Jun Lan, Beng Kang Tay, Gaokuo Zhong*, Jiangyu Li*, Mingqiang Huang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

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Engineering