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Phosphorus implant for S/D extension formation: Diffusion and activation study after spacer and spike anneal
S. H. Yeong*, B. Colombeau, F. Benistant, M. P. Srinivasan, C. P.A. Mulcahy, P. S. Lee, L. Chan
*Corresponding author for this work
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
3
Citations
(Scopus)