Abstract
The study of planar imaging system is an interesting topic because its compact structure and lightweight are consistent with the trend of production miniaturization. This paper presents our study of designing and fabricating planar imaging elements. Theoretical analysis of grating and off-axis imaging diffractive elements was conducted. A low-aberration symmetrical imaging optical system was designed and evaluated with CODE V. Using a variable intensity laser-writing system, diffractive surface relief patterns were written on photoresist and were later transferred to a fused quartz plate.
| Original language | English |
|---|---|
| Pages (from-to) | 157-166 |
| Number of pages | 10 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 3879 |
| Publication status | Published - 1999 |
| Externally published | Yes |
| Event | Proceedings of the 1999 Micromachine Technology for Diffractive and Holographic Optics - Santa Clara, CA, USA Duration: Sept 20 1999 → Sept 21 1999 |
ASJC Scopus Subject Areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering