Plasmon-enhanced polarized Raman spectroscopy for sensitive surface characterization

J. Kasim; X. Y. Tee; Y. M. You; Z. H. Ni; Y. Setiawan; P. S. Lee; L. Chan; Z. X. Shen

doi:10.1002/jrs.1999

Plasmon-enhanced polarized Raman spectroscopy for sensitive surface characterization

J. Kasim, X. Y. Tee, Y. M. You, Z. H. Ni, Y. Setiawan, P. S. Lee, L. Chan, Z. X. Shen

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Local-mode and localized surface plasmons generated on the silver thin film can selectively enhance the Raman signal from the surface. Further improvement of surface signal can be obtained by using the polarized Raman technique that results in a dramatic enhancement of the surface sensitivity by up to 25.4 times as compared to that without a silver coating. This technique will be very useful for Raman study on samples that suffer overlapping background signal. In this article, we show that it can be used to significantly improve the signal of thin strained-Si layer on top of SiGe buffer layer.

Original language	English
Pages (from-to)	1338-1342
Number of pages	5
Journal	Journal of Raman Spectroscopy
Volume	39
Issue number	10
DOIs	https://doi.org/10.1002/jrs.1999
Publication status	Published - Oct 2008
Externally published	Yes

ASJC Scopus Subject Areas

General Materials Science
Spectroscopy

Keywords

Depolarization
Enhancement
Raman spectroscopy
Strained-Si
Surface plasmons

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10.1002/jrs.1999

Cite this

@article{8cc4741676d74971bd24386eccb4eb74,

title = "Plasmon-enhanced polarized Raman spectroscopy for sensitive surface characterization",

abstract = "Local-mode and localized surface plasmons generated on the silver thin film can selectively enhance the Raman signal from the surface. Further improvement of surface signal can be obtained by using the polarized Raman technique that results in a dramatic enhancement of the surface sensitivity by up to 25.4 times as compared to that without a silver coating. This technique will be very useful for Raman study on samples that suffer overlapping background signal. In this article, we show that it can be used to significantly improve the signal of thin strained-Si layer on top of SiGe buffer layer.",

keywords = "Depolarization, Enhancement, Raman spectroscopy, Strained-Si, Surface plasmons",

author = "J. Kasim and Tee, \{X. Y.\} and You, \{Y. M.\} and Ni, \{Z. H.\} and Y. Setiawan and Lee, \{P. S.\} and L. Chan and Shen, \{Z. X.\}",

year = "2008",

month = oct,

doi = "10.1002/jrs.1999",

language = "English",

volume = "39",

pages = "1338--1342",

journal = "Journal of Raman Spectroscopy",

issn = "0377-0486",

publisher = "John Wiley and Sons Ltd",

number = "10",

}

TY - JOUR

T1 - Plasmon-enhanced polarized Raman spectroscopy for sensitive surface characterization

AU - Kasim, J.

AU - Tee, X. Y.

AU - You, Y. M.

AU - Ni, Z. H.

AU - Setiawan, Y.

AU - Lee, P. S.

AU - Chan, L.

AU - Shen, Z. X.

PY - 2008/10

Y1 - 2008/10

N2 - Local-mode and localized surface plasmons generated on the silver thin film can selectively enhance the Raman signal from the surface. Further improvement of surface signal can be obtained by using the polarized Raman technique that results in a dramatic enhancement of the surface sensitivity by up to 25.4 times as compared to that without a silver coating. This technique will be very useful for Raman study on samples that suffer overlapping background signal. In this article, we show that it can be used to significantly improve the signal of thin strained-Si layer on top of SiGe buffer layer.

AB - Local-mode and localized surface plasmons generated on the silver thin film can selectively enhance the Raman signal from the surface. Further improvement of surface signal can be obtained by using the polarized Raman technique that results in a dramatic enhancement of the surface sensitivity by up to 25.4 times as compared to that without a silver coating. This technique will be very useful for Raman study on samples that suffer overlapping background signal. In this article, we show that it can be used to significantly improve the signal of thin strained-Si layer on top of SiGe buffer layer.

KW - Depolarization

KW - Enhancement

KW - Raman spectroscopy

KW - Strained-Si

KW - Surface plasmons

UR - http://www.scopus.com/inward/record.url?scp=55449119129&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=55449119129&partnerID=8YFLogxK

U2 - 10.1002/jrs.1999

DO - 10.1002/jrs.1999

M3 - Article

AN - SCOPUS:55449119129

SN - 0377-0486

VL - 39

SP - 1338

EP - 1342

JO - Journal of Raman Spectroscopy

JF - Journal of Raman Spectroscopy

IS - 10

ER -

Plasmon-enhanced polarized Raman spectroscopy for sensitive surface characterization

Abstract

ASJC Scopus Subject Areas

Keywords

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