Preparation and properties of SrTiO 3 thin films produced by mist plasma evaporation using a metal nitrate aqueous precursor

Hui Huang; Xi Yao; Ooi Kiang Tan

doi:10.1002/cvde.200406329

Preparation and properties of SrTiO ₃ thin films produced by mist plasma evaporation using a metal nitrate aqueous precursor

Hui Huang^*, Xi Yao, Ooi Kiang Tan

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The mist plasma evaporation technique was developed to deposit SrTiO ₃ thin films under atmospheric pressure using an aqueous solution of strontium nitrate and titanium nitrate as the precursor. This technique is characterized by the injection of liquid reactants into thermal plasma where droplets of the precursor solution are partially or totally evaporated, decomposed, and ionized to their elements. The films deposited by mist plasma evaporation were cubic perovskite SrTiO ₃, and showed paraelectric properties at room temperature. The morphology of the SrTiO ₃ thin films was affected by substrate and substrate temperature. The dielectric constant and dielectric loss of the SrTiO ₃ film at 100 kHz were 58 and 0.239, respectively.

Original language	English
Pages (from-to)	142-146
Number of pages	5
Journal	Chemical Vapor Deposition
Volume	11
Issue number	3
DOIs	https://doi.org/10.1002/cvde.200406329
Publication status	Published - Mar 2005
Externally published	Yes

ASJC Scopus Subject Areas

General Chemistry
Surfaces and Interfaces
Process Chemistry and Technology

Keywords

Aqueous precursor
Dielectric properties
Mist plasma evaporation
Strontium titanate

Access to Document

10.1002/cvde.200406329

Cite this

@article{17cc2a3253d242e7ab8399242274bb37,

title = "Preparation and properties of SrTiO 3 thin films produced by mist plasma evaporation using a metal nitrate aqueous precursor",

abstract = "The mist plasma evaporation technique was developed to deposit SrTiO 3 thin films under atmospheric pressure using an aqueous solution of strontium nitrate and titanium nitrate as the precursor. This technique is characterized by the injection of liquid reactants into thermal plasma where droplets of the precursor solution are partially or totally evaporated, decomposed, and ionized to their elements. The films deposited by mist plasma evaporation were cubic perovskite SrTiO 3, and showed paraelectric properties at room temperature. The morphology of the SrTiO 3 thin films was affected by substrate and substrate temperature. The dielectric constant and dielectric loss of the SrTiO 3 film at 100 kHz were 58 and 0.239, respectively.",

keywords = "Aqueous precursor, Dielectric properties, Mist plasma evaporation, Strontium titanate",

author = "Hui Huang and Xi Yao and Tan, {Ooi Kiang}",

year = "2005",

month = mar,

doi = "10.1002/cvde.200406329",

language = "English",

volume = "11",

pages = "142--146",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

number = "3",

}

TY - JOUR

T1 - Preparation and properties of SrTiO 3 thin films produced by mist plasma evaporation using a metal nitrate aqueous precursor

AU - Huang, Hui

AU - Yao, Xi

AU - Tan, Ooi Kiang

PY - 2005/3

Y1 - 2005/3

N2 - The mist plasma evaporation technique was developed to deposit SrTiO 3 thin films under atmospheric pressure using an aqueous solution of strontium nitrate and titanium nitrate as the precursor. This technique is characterized by the injection of liquid reactants into thermal plasma where droplets of the precursor solution are partially or totally evaporated, decomposed, and ionized to their elements. The films deposited by mist plasma evaporation were cubic perovskite SrTiO 3, and showed paraelectric properties at room temperature. The morphology of the SrTiO 3 thin films was affected by substrate and substrate temperature. The dielectric constant and dielectric loss of the SrTiO 3 film at 100 kHz were 58 and 0.239, respectively.

AB - The mist plasma evaporation technique was developed to deposit SrTiO 3 thin films under atmospheric pressure using an aqueous solution of strontium nitrate and titanium nitrate as the precursor. This technique is characterized by the injection of liquid reactants into thermal plasma where droplets of the precursor solution are partially or totally evaporated, decomposed, and ionized to their elements. The films deposited by mist plasma evaporation were cubic perovskite SrTiO 3, and showed paraelectric properties at room temperature. The morphology of the SrTiO 3 thin films was affected by substrate and substrate temperature. The dielectric constant and dielectric loss of the SrTiO 3 film at 100 kHz were 58 and 0.239, respectively.

KW - Aqueous precursor

KW - Dielectric properties

KW - Mist plasma evaporation

KW - Strontium titanate

UR - http://www.scopus.com/inward/record.url?scp=21244451127&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=21244451127&partnerID=8YFLogxK

U2 - 10.1002/cvde.200406329

DO - 10.1002/cvde.200406329

M3 - Article

AN - SCOPUS:21244451127

SN - 0948-1907

VL - 11

SP - 142

EP - 146

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 3

ER -