Properties of amorphous ZrOx thin films deposited by filtered cathodic vacuum arc

Daniel H.C. Chua; W. I. Milne; Z. W. Zhao; B. K. Tay; S. P. Lau; T. Carney; R. G. White

doi:10.1016/j.jnoncrysol.2003.09.016

Properties of amorphous ZrO_x thin films deposited by filtered cathodic vacuum arc

Daniel H.C. Chua^*, W. I. Milne, Z. W. Zhao, B. K. Tay, S. P. Lau, T. Carney, R. G. White

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrO_x growth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrO_x thin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO _1.9 and at the interface, O-Zr-Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.

Original language	English
Pages (from-to)	185-189
Number of pages	5
Journal	Journal of Non-Crystalline Solids
Volume	332
Issue number	1-3
DOIs	https://doi.org/10.1016/j.jnoncrysol.2003.09.016
Publication status	Published - Dec 15 2003
Externally published	Yes

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Condensed Matter Physics
Materials Chemistry

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10.1016/j.jnoncrysol.2003.09.016

Cite this

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title = "Properties of amorphous ZrOx thin films deposited by filtered cathodic vacuum arc",

abstract = "The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrOx growth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrOx thin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO 1.9 and at the interface, O-Zr-Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.",

author = "Chua, {Daniel H.C.} and Milne, {W. I.} and Zhao, {Z. W.} and Tay, {B. K.} and Lau, {S. P.} and T. Carney and White, {R. G.}",

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doi = "10.1016/j.jnoncrysol.2003.09.016",

language = "English",

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TY - JOUR

T1 - Properties of amorphous ZrOx thin films deposited by filtered cathodic vacuum arc

AU - Chua, Daniel H.C.

AU - Milne, W. I.

AU - Zhao, Z. W.

AU - Tay, B. K.

AU - Lau, S. P.

AU - Carney, T.

AU - White, R. G.

PY - 2003/12/15

Y1 - 2003/12/15

N2 - The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrOx growth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrOx thin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO 1.9 and at the interface, O-Zr-Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.

AB - The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrOx growth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrOx thin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO 1.9 and at the interface, O-Zr-Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.

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ER -

Properties of amorphous ZrO_x thin films deposited by filtered cathodic vacuum arc

Abstract

ASJC Scopus Subject Areas

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