Properties of carbon ion deposited tetrahedral amorphous carbon films as a function of ion energy

Xu Shi*, B. K. Tay, H. S. Tan, Li Zhong, Y. Q. Tu, S. R.P. Silva, W. I. Milne

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

344 Citations (Scopus)

Abstract

Ion energy, controlled by the substrate bias, is an important parameter in determining properties of films deposited by the filtered cathodic vacuum arc technique. The substrate bias determines the ion energy distribution of the growth species. The ion energy is varied, while keeping the other deposition conditions constant, in order to study the effect of ion energy on the film properties. The films were characterized by their optical and mechanical parameters using an ellipsometer, surface profilometer, optical spectrometer, and nanoindenter. Electron energy-loss spectroscopy and Raman spectroscopy were used for structural analysis of the films.

Original languageEnglish
Pages (from-to)7234-7240
Number of pages7
JournalJournal of Applied Physics
Volume79
Issue number9
DOIs
Publication statusPublished - May 1 1996
Externally publishedYes

ASJC Scopus Subject Areas

  • General Physics and Astronomy

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