Abstract
Ion energy, controlled by the substrate bias, is an important parameter in determining properties of films deposited by the filtered cathodic vacuum arc technique. The substrate bias determines the ion energy distribution of the growth species. The ion energy is varied, while keeping the other deposition conditions constant, in order to study the effect of ion energy on the film properties. The films were characterized by their optical and mechanical parameters using an ellipsometer, surface profilometer, optical spectrometer, and nanoindenter. Electron energy-loss spectroscopy and Raman spectroscopy were used for structural analysis of the films.
Original language | English |
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Pages (from-to) | 7234-7240 |
Number of pages | 7 |
Journal | Journal of Applied Physics |
Volume | 79 |
Issue number | 9 |
DOIs | |
Publication status | Published - May 1 1996 |
Externally published | Yes |
ASJC Scopus Subject Areas
- General Physics and Astronomy