Property study of aluminium oxide thin films by thermal annealing

Zhiwei Zhao*, Beng Kang Tay

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under the oxygen partial pressure of 5 × 10 -4 Torr at room temperature. Annealing effects on the properties of the films between 200 °C and 900 °C were investigated. Experiments results showed that the surfaces of aluminium oxide thin films remained smooth up to 600 °C. Crystallization is induced for the film annealed at 900 °C. It was also found that refractive index of the films increased with increasing the annealing temperature. Strong frequency dispersion of refractive index was found and fitted to a single oscillator model. The dispersion parameters, such as single oscillator energy, dispersion energy, average oscillator strength and its related wavelength, were estimated.

Original languageEnglish
Pages (from-to)77-80
Number of pages4
JournalPhysica Status Solidi (C) Current Topics in Solid State Physics
Volume9
Issue number1
DOIs
Publication statusPublished - Jan 2012
Externally publishedYes

ASJC Scopus Subject Areas

  • Condensed Matter Physics

Keywords

  • Aluminium oxide
  • Annealing
  • Optical dispersion

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