Rapid fabrication of nanoneedle arrays by ion sputtering

Yi Zhong Huang; David J.H. Cockayne; Jausovec Ana-Vanessa; Russell P. Cowburn; Shou Guo Wang; Roger C.C. Ward

doi:10.1088/0957-4484/19/01/015303

Rapid fabrication of nanoneedle arrays by ion sputtering

Yi Zhong Huang^*, David J.H. Cockayne, Jausovec Ana-Vanessa, Russell P. Cowburn, Shou Guo Wang, Roger C.C. Ward

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

We report a novel method for rapidly fabricating ordered nanoneedles using an ion beam that cuts through the Fe/GaAs single thin layer or the Fe/MgO/Fe/GaAs multilayer producing a pillar pattern followed by raster-scanning normal to the patterned area. However, such ordered nanoneedles were not formed on the pure GaAs substrate surface without the thin Fe film coating, nor were nanoneedles formed on the GaAs substrate coated with a thin Cr epitaxial film, when this method was used. It has advantages over other methods, being simple, fast and well controlled for fabricating one-dimensional nanostructure arrays, leading to a range of applications such as high aspect ratio sharp tips for atomic force microscope/atom probes and consequent possible quantum confinement effects or arrays of nanostructures for field-optical/photoluminescence emission and data recording.

Original language	English
Article number	015303
Journal	Nanotechnology
Volume	19
Issue number	1
DOIs	https://doi.org/10.1088/0957-4484/19/01/015303
Publication status	Published - Jan 9 2008
Externally published	Yes

ASJC Scopus Subject Areas

Bioengineering
General Chemistry
General Materials Science
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

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Cite this

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title = "Rapid fabrication of nanoneedle arrays by ion sputtering",

abstract = "We report a novel method for rapidly fabricating ordered nanoneedles using an ion beam that cuts through the Fe/GaAs single thin layer or the Fe/MgO/Fe/GaAs multilayer producing a pillar pattern followed by raster-scanning normal to the patterned area. However, such ordered nanoneedles were not formed on the pure GaAs substrate surface without the thin Fe film coating, nor were nanoneedles formed on the GaAs substrate coated with a thin Cr epitaxial film, when this method was used. It has advantages over other methods, being simple, fast and well controlled for fabricating one-dimensional nanostructure arrays, leading to a range of applications such as high aspect ratio sharp tips for atomic force microscope/atom probes and consequent possible quantum confinement effects or arrays of nanostructures for field-optical/photoluminescence emission and data recording.",

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AU - Huang, Yi Zhong

AU - Cockayne, David J.H.

AU - Ana-Vanessa, Jausovec

AU - Cowburn, Russell P.

AU - Wang, Shou Guo

AU - Ward, Roger C.C.

PY - 2008/1/9

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N2 - We report a novel method for rapidly fabricating ordered nanoneedles using an ion beam that cuts through the Fe/GaAs single thin layer or the Fe/MgO/Fe/GaAs multilayer producing a pillar pattern followed by raster-scanning normal to the patterned area. However, such ordered nanoneedles were not formed on the pure GaAs substrate surface without the thin Fe film coating, nor were nanoneedles formed on the GaAs substrate coated with a thin Cr epitaxial film, when this method was used. It has advantages over other methods, being simple, fast and well controlled for fabricating one-dimensional nanostructure arrays, leading to a range of applications such as high aspect ratio sharp tips for atomic force microscope/atom probes and consequent possible quantum confinement effects or arrays of nanostructures for field-optical/photoluminescence emission and data recording.

AB - We report a novel method for rapidly fabricating ordered nanoneedles using an ion beam that cuts through the Fe/GaAs single thin layer or the Fe/MgO/Fe/GaAs multilayer producing a pillar pattern followed by raster-scanning normal to the patterned area. However, such ordered nanoneedles were not formed on the pure GaAs substrate surface without the thin Fe film coating, nor were nanoneedles formed on the GaAs substrate coated with a thin Cr epitaxial film, when this method was used. It has advantages over other methods, being simple, fast and well controlled for fabricating one-dimensional nanostructure arrays, leading to a range of applications such as high aspect ratio sharp tips for atomic force microscope/atom probes and consequent possible quantum confinement effects or arrays of nanostructures for field-optical/photoluminescence emission and data recording.

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Rapid fabrication of nanoneedle arrays by ion sputtering

Abstract

ASJC Scopus Subject Areas

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