Rapid thermal annealing of Ti-rich TiNi thin films: A new approach to fabricate patterned shape memory thin films

Y. Motemani; M. J. Tan; T. J. White; W. M. Huang

doi:10.1016/j.matdes.2010.07.039

Rapid thermal annealing of Ti-rich TiNi thin films: A new approach to fabricate patterned shape memory thin films

Y. Motemani, M. J. Tan^*, T. J. White, W. M. Huang

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

This paper reports the rapid thermal annealing (RTA) of Ti-rich TiNi thin films, synthesized by the co-sputtering of TiNi and Ti targets. Long-range order of aperiodic alloy could be achieved in a few seconds with the optimum temperature of 773. K. Longer annealing (773. K/240. s), transformed the film to a poorly ordered vitreous phase, suggesting a novel method for solid state amorphization. Reitveld refinement analyses showed significant differences in structural parameters of the films crystallized by rapid and conventional thermal annealing. Dependence of the elastic modulus on the valence electron density (VED) of the crystallized films was studied. It is suggested that RTA provides a new approach to fabricate patterned shape memory thin films.

Original language	English
Pages (from-to)	688-695
Number of pages	8
Journal	Materials and Design
Volume	32
Issue number	2
DOIs	https://doi.org/10.1016/j.matdes.2010.07.039
Publication status	Published - Feb 2011
Externally published	Yes

ASJC Scopus Subject Areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

Keywords

Crystalline state
Heat treatments
Intermetallics
X-ray analysis

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10.1016/j.matdes.2010.07.039

Cite this

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title = "Rapid thermal annealing of Ti-rich TiNi thin films: A new approach to fabricate patterned shape memory thin films",

abstract = "This paper reports the rapid thermal annealing (RTA) of Ti-rich TiNi thin films, synthesized by the co-sputtering of TiNi and Ti targets. Long-range order of aperiodic alloy could be achieved in a few seconds with the optimum temperature of 773. K. Longer annealing (773. K/240. s), transformed the film to a poorly ordered vitreous phase, suggesting a novel method for solid state amorphization. Reitveld refinement analyses showed significant differences in structural parameters of the films crystallized by rapid and conventional thermal annealing. Dependence of the elastic modulus on the valence electron density (VED) of the crystallized films was studied. It is suggested that RTA provides a new approach to fabricate patterned shape memory thin films.",

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T1 - Rapid thermal annealing of Ti-rich TiNi thin films

T2 - A new approach to fabricate patterned shape memory thin films

AU - Motemani, Y.

AU - Tan, M. J.

AU - White, T. J.

AU - Huang, W. M.

PY - 2011/2

Y1 - 2011/2

N2 - This paper reports the rapid thermal annealing (RTA) of Ti-rich TiNi thin films, synthesized by the co-sputtering of TiNi and Ti targets. Long-range order of aperiodic alloy could be achieved in a few seconds with the optimum temperature of 773. K. Longer annealing (773. K/240. s), transformed the film to a poorly ordered vitreous phase, suggesting a novel method for solid state amorphization. Reitveld refinement analyses showed significant differences in structural parameters of the films crystallized by rapid and conventional thermal annealing. Dependence of the elastic modulus on the valence electron density (VED) of the crystallized films was studied. It is suggested that RTA provides a new approach to fabricate patterned shape memory thin films.

AB - This paper reports the rapid thermal annealing (RTA) of Ti-rich TiNi thin films, synthesized by the co-sputtering of TiNi and Ti targets. Long-range order of aperiodic alloy could be achieved in a few seconds with the optimum temperature of 773. K. Longer annealing (773. K/240. s), transformed the film to a poorly ordered vitreous phase, suggesting a novel method for solid state amorphization. Reitveld refinement analyses showed significant differences in structural parameters of the films crystallized by rapid and conventional thermal annealing. Dependence of the elastic modulus on the valence electron density (VED) of the crystallized films was studied. It is suggested that RTA provides a new approach to fabricate patterned shape memory thin films.

KW - Crystalline state

KW - Heat treatments

KW - Intermetallics

KW - X-ray analysis

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DO - 10.1016/j.matdes.2010.07.039

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SN - 0264-1275

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JO - Materials and Design

JF - Materials and Design

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ER -

Rapid thermal annealing of Ti-rich TiNi thin films: A new approach to fabricate patterned shape memory thin films

Abstract

ASJC Scopus Subject Areas

Keywords

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