@inbook{3bf62d1475d34a2fb64c7ae742c9dd53,
title = "Rare-Earth Oxides as High-k Gate Dielectrics for Advanced Device Architectures",
keywords = "Device architecture, Dielectric constant, Fermi level pinning, Permittivity, Rare-earth oxides, Thermal stability",
author = "Lee, {Pooi See} and Chan, {Mei Yin} and Peter Damarwan",
year = "2012",
month = aug,
day = "23",
doi = "10.1002/9783527646340.ch16",
language = "English",
isbn = "9783527330324",
pages = "501--530",
booktitle = "High-k Gate Dielectrics for CMOS Technology",
publisher = "Wiley-VCH",
}