Replication of the nano-scale mold fabricated with focused ion beam

J. X. Gao; M. B. Chan-Park; D. Z. Xie; B. K.A. Ngoi

doi:10.1117/12.608028

Replication of the nano-scale mold fabricated with focused ion beam

J. X. Gao, M. B. Chan-Park^*, D. Z. Xie, B. K.A. Ngoi

^*Corresponding author for this work

Nanyang Technological University

Research output: Contribution to journal › Conference article › peer-review

Abstract

Silicon mold fabricated with Focused Ion Beam lithography (FIB) was used to make silicone elastomer molds. The silicon mold is composed of lattice of holes which the diameter and depth are about 200 nm and 60 nm, respectively. The silicone elastomer material was then used to replicate slavery mold. Our study show the replication process with the elastomer mold had been performed successfully and the diameter of humps on the elastomer mold is near to that of holes on the master mold. But the height of humps in the elastomer mold is only 42 nm and it is different from the depth of holes in the master mold.

Original language	English
Article number	149
Pages (from-to)	637-641
Number of pages	5
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5774
DOIs	https://doi.org/10.1117/12.608028
Publication status	Published - 2005
Externally published	Yes
Event	Fifth International Conference on Thin Film Physics and Applications - Shanghai, China Duration: May 31 2004 → Jun 2 2004

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Keywords

Elastomer
Mold
Replication
Silicon

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10.1117/12.608028

Cite this

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title = "Replication of the nano-scale mold fabricated with focused ion beam",

abstract = "Silicon mold fabricated with Focused Ion Beam lithography (FIB) was used to make silicone elastomer molds. The silicon mold is composed of lattice of holes which the diameter and depth are about 200 nm and 60 nm, respectively. The silicone elastomer material was then used to replicate slavery mold. Our study show the replication process with the elastomer mold had been performed successfully and the diameter of humps on the elastomer mold is near to that of holes on the master mold. But the height of humps in the elastomer mold is only 42 nm and it is different from the depth of holes in the master mold.",

keywords = "Elastomer, Mold, Replication, Silicon",

author = "Gao, {J. X.} and Chan-Park, {M. B.} and Xie, {D. Z.} and Ngoi, {B. K.A.}",

year = "2005",

doi = "10.1117/12.608028",

language = "English",

volume = "5774",

pages = "637--641",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Fifth International Conference on Thin Film Physics and Applications ; Conference date: 31-05-2004 Through 02-06-2004",

}

TY - JOUR

T1 - Replication of the nano-scale mold fabricated with focused ion beam

AU - Gao, J. X.

AU - Chan-Park, M. B.

AU - Xie, D. Z.

AU - Ngoi, B. K.A.

PY - 2005

Y1 - 2005

N2 - Silicon mold fabricated with Focused Ion Beam lithography (FIB) was used to make silicone elastomer molds. The silicon mold is composed of lattice of holes which the diameter and depth are about 200 nm and 60 nm, respectively. The silicone elastomer material was then used to replicate slavery mold. Our study show the replication process with the elastomer mold had been performed successfully and the diameter of humps on the elastomer mold is near to that of holes on the master mold. But the height of humps in the elastomer mold is only 42 nm and it is different from the depth of holes in the master mold.

AB - Silicon mold fabricated with Focused Ion Beam lithography (FIB) was used to make silicone elastomer molds. The silicon mold is composed of lattice of holes which the diameter and depth are about 200 nm and 60 nm, respectively. The silicone elastomer material was then used to replicate slavery mold. Our study show the replication process with the elastomer mold had been performed successfully and the diameter of humps on the elastomer mold is near to that of holes on the master mold. But the height of humps in the elastomer mold is only 42 nm and it is different from the depth of holes in the master mold.

KW - Elastomer

KW - Mold

KW - Replication

KW - Silicon

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DO - 10.1117/12.608028

M3 - Conference article

AN - SCOPUS:25644459405

SN - 0277-786X

VL - 5774

SP - 637

EP - 641

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 149

T2 - Fifth International Conference on Thin Film Physics and Applications

Y2 - 31 May 2004 through 2 June 2004

ER -

Replication of the nano-scale mold fabricated with focused ion beam

Abstract

ASJC Scopus Subject Areas

Keywords

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