Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition

Keyphrases

• Area-selective Atomic Layer Deposition 100%
• Block Copolymer Lithography 33%
• Feature Density 33%
• Feature Resolution 33%
• Flash Memory Devices 33%
• High Lateral Resolution 33%
• Hole Storage 33%
• Material Quality 66%
• Nonvolatile Flash Memory 33%
• Oxide Thickness 33%
• Polymer Template 33%
• Storage Centres 33%
• Storage Density 33%
• Sub-100 Nm 33%
• Tunnel Oxide 33%
• ZnO Array 33%

Material Science

• Block Copolymer 25%
• Capacitor 25%
• Copolymer 25%
• Density 100%
• Electrical Property 25%
• Lithography 100%
• Mechanical Stability 50%
• Nanostructure 25%
• Oxide Compound 25%
• Zinc Oxide 100%
• ZnO 75%

Engineering

• Feature Density 25%
• Material Quality 50%
• Nanoimprint Lithography 100%