Abstract
We report a method to promote solid source growth of Si oxide nanowires (SiONWs) by using an array of vertically aligned carbon nanotubes (CNTs). It starts with the fabrication of CNT array by plasma enhanced chemical vapor deposition (PECVD) on Si wafers, followed by growth of SiONWs. Herein, CNTs serve as a scaffold, which helps the dispersion of catalysts for SiONWs and also provides space for hydrogen which boosts the diffusion of Si atoms and hence formation of SiONWs. As the result, a three dimensional (3D) hybrid network of densely packed SiONWs and CNTs can be produced rapidly.
Original language | English |
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Pages (from-to) | 119-123 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 314 |
DOIs | |
Publication status | Published - Sept 30 2014 |
Externally published | Yes |
ASJC Scopus Subject Areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
Keywords
- Carbon nanotube
- Nanowire
- Silicon
- Solid-liquid-solid mechanism