Spatially controlled oxygen inhibition of acrylate photopolymerization as a new lithography method for high-performance organic thin-film transistors

A new concept-based lithography with use of spatially controlled oxygen inhibition of photopolymerization in acrylate-based materials as a micropatterning technique and its application in high-performance top- and bottom-gated organic thin-film transistors (OTFTs) on flexible substrates are demonstrated. This process does not rely on any surface/interfacial chemistry or adhesives and thus can be used in the patterning of a broad range of materials for printed organic electronics. It is also capable of achieving high resolution (3 -m), which is sufficient in OTFT-based organic electronics applications. The bottom-gated pentacene transistors show a remarkably high mobility of 1.02 cm² V^-1 S^-1, which is among the highest mobilities in flexible transistors fabricated by low-cost patterning processes.