Spectroscopic study of titanium oxide thin films at low temperatures by X-ray diffraction, Raman scattering, fourier transform infrared spectroscopy and photoluminescence

Zhiwei Zhao*, Beng Kang Tay

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Titanium oxide thin films were prepared by filtered cathodic vacuum arc (FCVA) at low temperatures ranged from room temperature to 330°C. Spectroscopic study of the deposited films were carried out by X-ray diffraction, Raman Scattering, Fourier transform infrared spectroscopy (FTIR) and photoluminescence (PL), respectively. The films remained amorphous up to the substrate temperature of 230°C. Nanocrystalline titanium oxide thin films occurred at 330°C with the strongest peak intensity from anatase (101) plane. The average grain size was around 20 nm and no rutile phase could be found. Various allowed vibrational frequencies (e.g. 152,199, 399, 640 cm -1) in Raman spectra and Ti-O-Ti transverse mode at 436 cm -1 in the FTIR spectrum evidently verified the presence of anatase phase in the films at 330°C. Moreover, at room temperature only crystalline film exhibited a PL peak with the center at 379 nm in PL spectrum and the origin is discussed.

Original languageEnglish
Title of host publicationCurrent and Future Trends of Functional Oxide Films
PublisherMaterials Research Society
Pages111-117
Number of pages7
ISBN (Print)1558998853, 9781558998858
DOIs
Publication statusPublished - 2006
Externally publishedYes
Event2006 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 17 2006Apr 21 2006

Publication series

NameMaterials Research Society Symposium Proceedings
Volume928
ISSN (Print)0272-9172

Conference

Conference2006 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period4/17/064/21/06

ASJC Scopus Subject Areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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