Abstract
Highly conductive and transparent aluminum-doped zinc oxide (ZnO:Al) thin films have been prepared using the filtered cathodic vacuum arc technique at relatively low temperatures. The properties of ZnO:Al films under the influence of substrate temperature were investigated. It was found that the optical, electrical and structural properties of the films depended directly on substrate temperature during deposition. ZnO:Al films exhibited c-axis oriented crystal growth. The ZnO:Al films were prepared using Zn-Al alloy targets with various Al content. The lowest resistivity of 8×10-4 Ωcm was obtained for the Al-doped (5 at%) film prepared at a substrate temperature of 150°C. The optical absorption edge was found to shift to the shorter wavelength with a reduction in substrate temperature, and it was found that doping with Al had the effect of broadening the optical band gap, with both cases being attributed to the Burstein-Moss shift.
Original language | English |
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Pages (from-to) | 596-601 |
Number of pages | 6 |
Journal | Journal of Crystal Growth |
Volume | 268 |
Issue number | 3-4 SPEC. ISS. |
DOIs | |
Publication status | Published - Aug 1 2004 |
Externally published | Yes |
Event | ICMAT 2003, Symposium H, Compound Semiconductors in Electronic - Singapore, Singapore Duration: Dec 7 2003 → Dec 12 2004 |
ASJC Scopus Subject Areas
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry
Keywords
- A3. Filtered cathodic vacuum arc
- B1. ZnO:Al
- B2. Semiconducting II-VI materials