Structural properties and nanoindentation of AlN films by a filtered cathodic vacuum arc at low temperature

X. H. Ji; S. P. Lau; G. Q. Yu; W. H. Zhong; B. K. Tay

doi:10.1088/0022-3727/37/10/009

Structural properties and nanoindentation of AlN films by a filtered cathodic vacuum arc at low temperature

X. H. Ji, S. P. Lau^*, G. Q. Yu, W. H. Zhong, B. K. Tay

^*Corresponding author for this work

Nanyang Technological University

Research output: Contribution to journal › Article › peer-review

31 Citations (Scopus)

Abstract

Aluminium nitride (AlN) films have been fabricated on Si(100) substrates by an ion-beam-assisted filtered cathodic vacuum arc technique at low temperature. The structural and mechanical properties of the AlN films have been investigated using x-ray photoelectron spectroscopy, by means of an x-ray diffractometer, visible Raman spectroscopy, atomic force microscopy and nanoindentation. The AlN films exhibit a predominant a-axis orientation with hardness as high as 14.5 GPa, which may be suitable for surface acoustic wave devices.

Original language	English
Pages (from-to)	1472-1477
Number of pages	6
Journal	Journal Physics D: Applied Physics
Volume	37
Issue number	10
DOIs	https://doi.org/10.1088/0022-3727/37/10/009
Publication status	Published - May 21 2004
Externally published	Yes

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Acoustics and Ultrasonics
Surfaces, Coatings and Films

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abstract = "Aluminium nitride (AlN) films have been fabricated on Si(100) substrates by an ion-beam-assisted filtered cathodic vacuum arc technique at low temperature. The structural and mechanical properties of the AlN films have been investigated using x-ray photoelectron spectroscopy, by means of an x-ray diffractometer, visible Raman spectroscopy, atomic force microscopy and nanoindentation. The AlN films exhibit a predominant a-axis orientation with hardness as high as 14.5 GPa, which may be suitable for surface acoustic wave devices.",

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AU - Lau, S. P.

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AU - Zhong, W. H.

AU - Tay, B. K.

PY - 2004/5/21

Y1 - 2004/5/21

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AB - Aluminium nitride (AlN) films have been fabricated on Si(100) substrates by an ion-beam-assisted filtered cathodic vacuum arc technique at low temperature. The structural and mechanical properties of the AlN films have been investigated using x-ray photoelectron spectroscopy, by means of an x-ray diffractometer, visible Raman spectroscopy, atomic force microscopy and nanoindentation. The AlN films exhibit a predominant a-axis orientation with hardness as high as 14.5 GPa, which may be suitable for surface acoustic wave devices.

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Structural properties and nanoindentation of AlN films by a filtered cathodic vacuum arc at low temperature

Abstract

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