Study of spacer architecture and current leakage aspects of sub-micron self-aligned silicide process

C. W. Lim*, S. K. Lahiri, K. L. Pey, K. H. Lee, H. Wong, Vijay N. Chhagan, P. S. Tan, W. H. Chiu, L. Chan

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

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Chemical Engineering

Material Science

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