Tellurium-Assisted Low-Temperature Synthesis of MoS2 and WS2 Monolayers

Yongji Gong, Zhong Lin, Gonglan Ye, Gang Shi, Simin Feng, Yu Lei, Ana Laura Elías, Nestor Perea-Lopez, Robert Vajtai, Humberto Terrones, Zheng Liu, Mauricio Terrones*, Pulickel M. Ajayan

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

140 Citations (Scopus)

Abstract

Chemical vapor deposition (CVD) is a scalable method able to synthesize MoS2 and WS2 monolayers. In this work, we reduced the synthesis temperature by 200 °C only by introducing tellurium (Te) into the CVD process. The as-synthesized MoS2 and WS2 monolayers show high phase purity and crystallinity. The optical and electrical performance of these materials is comparable to those synthesized at higher temperatures. We believe this work will accelerate the industrial synthesis of these semiconducting monolayers.

Original languageEnglish
Pages (from-to)11658-11666
Number of pages9
JournalACS Nano
Volume9
Issue number12
DOIs
Publication statusPublished - Oct 26 2015
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2015 American Chemical Society.

ASJC Scopus Subject Areas

  • General Materials Science
  • General Engineering
  • General Physics and Astronomy

Keywords

  • chemical vapor deposition
  • molybdenum disulfide
  • transition metal dichalcogenides
  • tungsten disulfide
  • two-dimensional materials

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