TY - JOUR
T1 - The effect of annealing temperature on the optical properties of in2s3 thin film
AU - Boxi, Xu
AU - Kumar, Mulmudi Hemant
AU - Prabhakar, Rajiv Ramanujam
AU - Mathews, Nripan
AU - Mhaisalkar, Subodh G.
PY - 2012/7
Y1 - 2012/7
N2 - Indium Sulfide (In2S3) thin film were deposited on glass substrate through successive ionic layer adsorption and reaction (SILAR) method. The samples were annealed at 250 °C, 350 °C and 450 °C respectively after deposition. The X-ray diffraction (XRD) analysis shows that the sample annealed at 450 °C has the most clear and obvious XRD pattern, which indicates that In2S3 annealed at 450 °C possess the highest crystallinity. Ultraviolet-visible spectroscopy analysis of the samples shows that the band gap of In2S3 is around 2 eV. This study shows that annealing does not induce any change in optical bandgap of In2S3 thin films on glass substrates as reported elsewhere.
AB - Indium Sulfide (In2S3) thin film were deposited on glass substrate through successive ionic layer adsorption and reaction (SILAR) method. The samples were annealed at 250 °C, 350 °C and 450 °C respectively after deposition. The X-ray diffraction (XRD) analysis shows that the sample annealed at 450 °C has the most clear and obvious XRD pattern, which indicates that In2S3 annealed at 450 °C possess the highest crystallinity. Ultraviolet-visible spectroscopy analysis of the samples shows that the band gap of In2S3 is around 2 eV. This study shows that annealing does not induce any change in optical bandgap of In2S3 thin films on glass substrates as reported elsewhere.
KW - Annealing
KW - Bandgap
KW - Crystallinity
KW - Indium Sulfide
KW - Solar Cell
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U2 - 10.1166/nnl.2012.1386
DO - 10.1166/nnl.2012.1386
M3 - Article
AN - SCOPUS:84864843607
SN - 1941-4900
VL - 4
SP - 747
EP - 749
JO - Nanoscience and Nanotechnology Letters
JF - Nanoscience and Nanotechnology Letters
IS - 7
ER -