The influence of titanium nitride barrier layer on the properties of CNT bundles

Chin Chong Yap*, Dunlin Tan, Christophe Brun, Hong Li, Edwin Hang Tong Teo, Baillargeat Dominique, Beng Kang Tay

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

The use of carbon nanotubes (CNTs) for electrical interconnections is hinder by the possibility of growing CNT directly onto metallization. The introduction of barrier layer between catalyst and metallization is thus essential to permit the direct growth of vertically aligned CNT bundles using CVD approaches. As a result, the resultant CNT bundle resistivity is not only a function of the densities and quality of CNT growth, but is also affected by the thickness and resistivity of the barrier layer. CNT is growth on different thickness of TiN with 2 different underlying layers (Au and SiO2). It was observed that the length of CNT grown on Au is independent of TiN thickness, whereas the height decreases for Au underlayers case. In both scenarios, both have well aligned CNTs growth when the thickness of TiN is < 90nm.

Original languageEnglish
Title of host publicationProceedings of the 2013 IEEE 5th International Nanoelectronics Conference, INEC 2013
Pages4-6
Number of pages3
DOIs
Publication statusPublished - 2013
Externally publishedYes
Event2013 IEEE 5th International Nanoelectronics Conference, INEC 2013 - Singapore, Singapore
Duration: Jan 2 2013Jan 4 2013

Publication series

NameProceedings - Winter Simulation Conference
ISSN (Print)0891-7736

Conference

Conference2013 IEEE 5th International Nanoelectronics Conference, INEC 2013
Country/TerritorySingapore
CitySingapore
Period1/2/131/4/13

ASJC Scopus Subject Areas

  • Software
  • Modelling and Simulation
  • Computer Science Applications

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