Towards atomic level vanadium doping of TiO2 via liquid-phase atomic layer deposition

Yaodong Shen, Thelese R.B. Foong, Xiao Hu*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

Vanadium-doping of TiO2 at the atomic level was achieved via a liquid phase atomic layer deposition (L-ALD) method. UV-vis absorption edge of vanadium-doped TiO2 has been red-shifted ∼55 nm into visible light region. Photocatalytical assessment reveals that the degradation rate of methylene blue (MB) for vanadium-doped TiO2 under visible light illumination was enhanced by up to 500% compared to the undoped TiO2. This improvement was believed to be attributed to the atomic level doping of the L-ALD method.

Original languageEnglish
Pages (from-to)87-90
Number of pages4
JournalApplied Catalysis A: General
Volume409-410
DOIs
Publication statusPublished - Dec 15 2011
Externally publishedYes

ASJC Scopus Subject Areas

  • Catalysis
  • Process Chemistry and Technology

Keywords

  • Atomic force microscopy (AFM)
  • Atomic layer epitaxy
  • Crystalline oxide

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