Tribological properties of tetrahedral carbon films deposited by filtered cathodic vacuum arc technique

X. Shi; B. K. Tay; D. I. Flynn; Z. Sun

doi:10.1557/proc-436-293

Tribological properties of tetrahedral carbon films deposited by filtered cathodic vacuum arc technique

X. Shi^*, B. K. Tay, D. I. Flynn, Z. Sun

^*Corresponding author for this work

Nanyang Technological University

Research output: Chapter in Book/Report/Conference proceeding › Chapter

10 Citations (Scopus)

Abstract

Ta-C films have been deposited using FCVA technique. The hardness and Young's modulus of the films on both silicon and sapphire substrates are determined by an ultra low load depth sensing nanoindenter to examine their dependence on the carbon ion energy. An optimum ion energy around 80 to 90 eV has been found, which coincides with the energy at which the sp³ content and film density reach maximum values. At this ion energy, the hardness, modulus and critical load of a 60 nm film on sapphire exhibit maximum values of 60 GPa, 580 GPa and 7 mN, respectively, whilst the frictional coefficient shows a minimum of 0.16.

Original language	English
Title of host publication	Thin Films
Subtitle of host publication	Stresses and Mechanical Properties VI
DOIs	https://doi.org/10.1557/proc-436-293
Publication status	Published - 1996
Externally published	Yes
Event	Proceedings of the 1996 MRS Spring Meeting - San Francisco, CA, USA Duration: Apr 8 1996 → Apr 12 1996

Publication series

Name	Materials Research Society Symposium - Proceedings
Volume	436
ISSN (Print)	0272-9172

Conference

Conference	Proceedings of the 1996 MRS Spring Meeting
City	San Francisco, CA, USA
Period	4/8/96 → 4/12/96

ASJC Scopus Subject Areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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title = "Tribological properties of tetrahedral carbon films deposited by filtered cathodic vacuum arc technique",

abstract = "Ta-C films have been deposited using FCVA technique. The hardness and Young's modulus of the films on both silicon and sapphire substrates are determined by an ultra low load depth sensing nanoindenter to examine their dependence on the carbon ion energy. An optimum ion energy around 80 to 90 eV has been found, which coincides with the energy at which the sp3 content and film density reach maximum values. At this ion energy, the hardness, modulus and critical load of a 60 nm film on sapphire exhibit maximum values of 60 GPa, 580 GPa and 7 mN, respectively, whilst the frictional coefficient shows a minimum of 0.16.",

author = "X. Shi and Tay, {B. K.} and Flynn, {D. I.} and Z. Sun",

year = "1996",

doi = "10.1557/proc-436-293",

language = "English",

series = "Materials Research Society Symposium - Proceedings",

booktitle = "Thin Films",

note = "Proceedings of the 1996 MRS Spring Meeting ; Conference date: 08-04-1996 Through 12-04-1996",

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Shi, X, Tay, BK, Flynn, DI & Sun, Z 1996, Tribological properties of tetrahedral carbon films deposited by filtered cathodic vacuum arc technique. in Thin Films: Stresses and Mechanical Properties VI. Materials Research Society Symposium - Proceedings, vol. 436, Proceedings of the 1996 MRS Spring Meeting, San Francisco, CA, USA, 4/8/96. https://doi.org/10.1557/proc-436-293

TY - CHAP

T1 - Tribological properties of tetrahedral carbon films deposited by filtered cathodic vacuum arc technique

AU - Shi, X.

AU - Tay, B. K.

AU - Flynn, D. I.

AU - Sun, Z.

PY - 1996

Y1 - 1996

N2 - Ta-C films have been deposited using FCVA technique. The hardness and Young's modulus of the films on both silicon and sapphire substrates are determined by an ultra low load depth sensing nanoindenter to examine their dependence on the carbon ion energy. An optimum ion energy around 80 to 90 eV has been found, which coincides with the energy at which the sp3 content and film density reach maximum values. At this ion energy, the hardness, modulus and critical load of a 60 nm film on sapphire exhibit maximum values of 60 GPa, 580 GPa and 7 mN, respectively, whilst the frictional coefficient shows a minimum of 0.16.

AB - Ta-C films have been deposited using FCVA technique. The hardness and Young's modulus of the films on both silicon and sapphire substrates are determined by an ultra low load depth sensing nanoindenter to examine their dependence on the carbon ion energy. An optimum ion energy around 80 to 90 eV has been found, which coincides with the energy at which the sp3 content and film density reach maximum values. At this ion energy, the hardness, modulus and critical load of a 60 nm film on sapphire exhibit maximum values of 60 GPa, 580 GPa and 7 mN, respectively, whilst the frictional coefficient shows a minimum of 0.16.

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M3 - Chapter

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T2 - Proceedings of the 1996 MRS Spring Meeting

Y2 - 8 April 1996 through 12 April 1996

ER -

Tribological properties of tetrahedral carbon films deposited by filtered cathodic vacuum arc technique

Abstract

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