Abstract
This paper reports for the first time that by subjecting electron beam exposed SU-8 to a post exposure delay of one hour, the resist contrast improves ten-fold. Thereafter, hard bake process is introduced to reduce resist peel off from the substrate. The SU-8 is used as a hard mask to fabricate 90° pillars on Si substrate with an etch selectivity of 1:60. High refractive index Si pillars and low refractive index air gap form the building block of dielectric Bragg mirror. In total, two sets of Si-Air mirrors sandwich a varying cavity length on each side. The linear variable optical filter (LVOF) is measured and characterized using a bench-Top spectrometer as well as scanning electron microscopy. The filter has a bandpass from 3100 to 3900 nm and a scallop size of 30 nm which outperforms the λ10 norm.
Original language | English |
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Title of host publication | NEMS 2018 - 13th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 652-655 |
Number of pages | 4 |
ISBN (Electronic) | 9781538652732 |
DOIs | |
Publication status | Published - Dec 3 2018 |
Externally published | Yes |
Event | 13th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2018 - Singapore, Singapore Duration: Apr 22 2018 → Apr 26 2018 |
Publication series
Name | NEMS 2018 - 13th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems |
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Conference
Conference | 13th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2018 |
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Country/Territory | Singapore |
City | Singapore |
Period | 4/22/18 → 4/26/18 |
Bibliographical note
Publisher Copyright:© 2018 IEEE.
ASJC Scopus Subject Areas
- Biomedical Engineering
- Electrical and Electronic Engineering
- Instrumentation