Abstract
An ultrasensitive phototransistor was fabricated based on K-intercalated MoO 3 single nanowire. Devices with ultrafast photoresponse rate, high responsivity, and broad spectral response range were demonstrated. Detailed analysis of the charge transport in the device revealed the coexistence of both thermal-activation and photoactivation mechanisms. The promising results are expected to promote the potential of this material in nano/micro-scaled photoelectronic applications.
Original language | English |
---|---|
Pages (from-to) | 22015-22020 |
Number of pages | 6 |
Journal | Journal of Physical Chemistry C |
Volume | 116 |
Issue number | 41 |
DOIs | |
Publication status | Published - Oct 18 2012 |
Externally published | Yes |
ASJC Scopus Subject Areas
- Electronic, Optical and Magnetic Materials
- General Energy
- Physical and Theoretical Chemistry
- Surfaces, Coatings and Films