Ultraviolet laser lithography of conjugated polythiophene thin films

T. K.S. Wong*, Y. L. Lam, Y. C. Chan, X. Hu, H. Liu

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

Abstract

A study demonstrates that conjugated polymers from the polythiophene series can be patterned directly by using the 325 nm ultraviolet radiation from a helium cadmium laser. The mechanisms of the patterning processes are elucidated and the linewidths trends shown.

Original languageEnglish
Pages309
Number of pages1
Publication statusPublished - 1998
Externally publishedYes
EventProceedings of the 1998 International Symposium on Information Theory, CLEO/EUROPE'98 - Glasgow, Scotland
Duration: Sept 14 1998Sept 18 1998

Conference

ConferenceProceedings of the 1998 International Symposium on Information Theory, CLEO/EUROPE'98
CityGlasgow, Scotland
Period9/14/989/18/98

ASJC Scopus Subject Areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Ultraviolet laser lithography of conjugated polythiophene thin films'. Together they form a unique fingerprint.

Cite this